Influence of duty cycle on biocompatibility of nanostructured tantalum film deposited by pulsed DC PACVD
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Author(s)
Abstract
Nanostructured Tantalum (Ta) thin films were deposited by plasma assisted chemical vapor deposition (PACVD) at duty cycles of 17%, 25%, and 33%. FESEM and MTT assay indicated that the Ta film deposited at duty cycle of 25% provides the best surface biocompatibility because of its flawless and uniform structure. Furthermore, Rockwell adhesion test indicated that the best film adhesion observed in Ta film that deposited at duty cycle of 25% and this attributed to its dominant α-phase structure.
Keywords
Keywords: Nanostructure; Tantalum; PACVD; Biocompatibility
Cite this paper
H. Ghorbani, A. Abdollah-zadeh, A. Poladi,
Influence of duty cycle on biocompatibility of nanostructured tantalum film deposited by pulsed DC PACVD
, SCIREA Journal of Materials.
Volume 1, Issue 1, October 2016 | PP. 31-36.
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